| 摘要 |
PROBLEM TO BE SOLVED: To form a hard film on a substrate employing physical vapor deposition, which shows an oxidation resistance at≥1,000°C and a good wear resistance. SOLUTION: A hard film comprising a nitride or an oxynitride which essentially comprises Al, Cr and at least one element chosen from rare-earth elements including La, Ce and misch metal is formed on the surface of a substrate to be treated. The hard film optionally further contains B and Si as metal components. COPYRIGHT: (C)2004,JPO&NCIPI
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