| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition exhibiting sufficient transmitting property when a light source at 157 nm is used and causing little line edge roughness, development defects and scum. <P>SOLUTION: The positive resist composition contains: (A) a resin which has a norbornene-based repeating unit having a specified norbornane structure in the side chain and which increases the solubility with an alkali developing solution by the effect of an acid; and (B) a compound which generates an acid by irradiation of active rays or radiation. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
