发明名称 HALOGEN-BASED GAS CHARGING CONTAINER, GAS CHARGED IN THE SAME, AND METHOD FOR PROCESSING CHARGING CONTAINER
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a metal container for charging halogen-based gas provided with inner surface treatment by use of abrasive material, in which deterioration of purity due to increase of impurities other than water content or inner surface adsorption gas by aging will not occur after charging gas, and halogen-based gas of high purity. <P>SOLUTION: This metal container for charging halogen-based gas is composed in such a way that area of Si2s peak in X-ray photoelectron spectrum on the inner surface of the metal container, to which inner surface treatment is conducted by use of abrasive material, divided by area of Fe2P<SB>3/2</SB>peak is 0.3 or less. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004270917(A) 申请公布日期 2004.09.30
申请号 JP20030286792 申请日期 2003.08.05
申请人 MITSUI CHEMICALS INC 发明人 YOSHIKAWA AKIO;KANAYAMA SHIGEO;HARADA ISAO
分类号 B24B31/00;F17C1/00;F17C1/10;(IPC1-7):F17C1/00 主分类号 B24B31/00
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