发明名称 |
Monitoring device and method for operating clean-in-place system |
摘要 |
A method for cleaning an apparatus using a clean-in-place system is disclosed. The clean-in-place system is in fluid communication with an inlet and an outlet of the apparatus. In the method, a cleaning composition having a measurable physical property (e.g., pH) is supplied from a cleaner tank into the inlet of the apparatus for a first period of time. A rinsing composition having the measurable physical property at a second measured value is then supplied from a rinse tank into the inlet of the apparatus for a second period of time. The measurable physical property is sensed versus time for fluids exiting the outlet of the apparatus, and a circulation time of the cleaning composition is determined. A closing time for a return valve of the cleaner tank is then determined for subsequent cleaning cycles such that minimal rinsing composition enters the cleaner tank during the subsequent cleaning cycle.
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申请公布号 |
US2004187897(A1) |
申请公布日期 |
2004.09.30 |
申请号 |
US20040823204 |
申请日期 |
2004.04.13 |
申请人 |
KENOWSKI ANDY;BOHANON LEO F. |
发明人 |
KENOWSKI ANDY;BOHANON LEO F. |
分类号 |
B08B9/02;B08B9/032;(IPC1-7):B08B7/04 |
主分类号 |
B08B9/02 |
代理机构 |
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地址 |
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