发明名称 Dual-bulge flexure ring for CMP head
摘要 A diaphragm flexure for a polishing head on a chemical mechanical polisher, particularly a Titan ((TM)) polishing head. The diaphragm flexure includes an annular flexure body having at least one bulge or protrusion formed in the upper surface thereof and at least one bulge or protrusion formed in the lower surface thereof. In assembly of the polishing head, each of the at least one inner and outer bulge or protrusion is inserted in a corresponding groove provided in a surface of an adjacent element of the polishing head. The elements in the polishing head are secured together with the flexure body typically by extending screws through respective screw openings in the elements and the flexure body.
申请公布号 US2004192179(A1) 申请公布日期 2004.09.30
申请号 US20030402285 申请日期 2003.03.27
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., 发明人 HUANG WEN-JUNG;WU WEI-TE
分类号 B24B37/04;(IPC1-7):B24B5/00 主分类号 B24B37/04
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