| 摘要 |
PROBLEM TO BE SOLVED: To provide a highly reliable semiconductor manufacturing equipment that can realize initial calibration for using an interference waveform reflecting a refractive index during plasma discharging, a semiconductor device and a method for manufacturing the same. SOLUTION: A reference table 20 wherein an actual step difference measured groove 21 is provided is prepared on a placement table 12 within a processing chamber 11 as a dry-etching device. A coherent light processing mechanism 17 emits an inspection light L (Lin, Lre) to the reference table 20 in a plasma. A calculation mechanism 18 acquires a sample for step difference measurement utilizing refractive index of interference waveform. A correction calculation mechanism 19 compares a measured step difference obtained by the calculation mechanism 18 on the reference table 20, with an actually measured value of the step difference of the reference table 20, and controls the system so as to approximate to reduce the error between the two values. After completion of control correction of the calculation mechanism 18, an actual wafer processing is activated. COPYRIGHT: (C)2004,JPO&NCIPI
|
