发明名称 |
Methods of forming conductive patterns using barrier layers |
摘要 |
A conductive pattern can be formed in a mold layer by removing a portion of a barrier layer outside an intaglio pattern in a mold layer to expose an upper surface of the mold layer and avoiding removing a portion of the barrier layer on the intaglio pattern. A conductive layer can be formed on the portion of the barrier layer on the intaglio pattern and on the upper surface of the mold layer. The conductive layer can be removed from the upper surface of the mold layer.
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申请公布号 |
US2004192023(A1) |
申请公布日期 |
2004.09.30 |
申请号 |
US20040813330 |
申请日期 |
2004.03.30 |
申请人 |
LEE JONG-MYEONG;CHOI GIL-HEYUN;LEE SANG-WOO;KIM BYUNG-HEE;SEO JUNG-HUN |
发明人 |
LEE JONG-MYEONG;CHOI GIL-HEYUN;LEE SANG-WOO;KIM BYUNG-HEE;SEO JUNG-HUN |
分类号 |
H01L21/28;H01L21/44;H01L21/4763;H01L21/768;(IPC1-7):H01L21/476 |
主分类号 |
H01L21/28 |
代理机构 |
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地址 |
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