发明名称 Methods of forming conductive patterns using barrier layers
摘要 A conductive pattern can be formed in a mold layer by removing a portion of a barrier layer outside an intaglio pattern in a mold layer to expose an upper surface of the mold layer and avoiding removing a portion of the barrier layer on the intaglio pattern. A conductive layer can be formed on the portion of the barrier layer on the intaglio pattern and on the upper surface of the mold layer. The conductive layer can be removed from the upper surface of the mold layer.
申请公布号 US2004192023(A1) 申请公布日期 2004.09.30
申请号 US20040813330 申请日期 2004.03.30
申请人 LEE JONG-MYEONG;CHOI GIL-HEYUN;LEE SANG-WOO;KIM BYUNG-HEE;SEO JUNG-HUN 发明人 LEE JONG-MYEONG;CHOI GIL-HEYUN;LEE SANG-WOO;KIM BYUNG-HEE;SEO JUNG-HUN
分类号 H01L21/28;H01L21/44;H01L21/4763;H01L21/768;(IPC1-7):H01L21/476 主分类号 H01L21/28
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