| 摘要 |
PROBLEM TO BE SOLVED: To provide an EUV aligner that enables aberration measurement without accompanying a cost rise. SOLUTION: Under a condition where no aberration exists as shown in Fig.(A), no difference exists in the output between aberration measuring apertures (I) and (II) as shown in the lower lines of Fig.(A) (drawn in an inverted state, because the position of the aberration measuring aperture pattern is inverted), but, under the condition shown in Fig.(B), the difference in the signal output between the apertures (I) and (II) (the difference between the outputs from the apertures where right and left is inverted in one of them in the figure) can be evaluated as the amount of aberration, because a difference occurs in the output of an EUV sensor between the apertures (I) and (II) as shown in the lower lines of Fig.(B). COPYRIGHT: (C)2004,JPO&NCIPI
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