发明名称 |
Method and device for decontaminating optical surfaces |
摘要 |
A method and a device for decontaminating optical surfaces, in particular for decontaminating the surfaces of beam-guiding optics employing UV-radiation in a cleansing atmosphere. The wavelength of the UV-radiation employed falls within a range where oxygen strongly absorbs and the cleansing atmosphere has an oxygen concentration less than that of air. The method and device have application to, e.g., cleaning the surfaces of the beam-guiding optics of microlithographic projection-exposure systems.
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申请公布号 |
US6796664(B2) |
申请公布日期 |
2004.09.28 |
申请号 |
US20030385643 |
申请日期 |
2003.03.12 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
LUEDECKE JENS;ZAZCEK CHRISTOPH;PAZIDIS ALEXANDRA;ULLMANN JENS;MUEHLPFORDT ANNETTE;THIER MICHAEL;WIESNER STEFAN |
分类号 |
B08B7/00;G03F7/20;H01L21/027;(IPC1-7):G02B11/04 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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地址 |
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