| 摘要 |
An exposure apparatus comprising a light source which emits a light including a main light having a wavelength to expose a substrate and sub light having a different wavelength from that of the main light collaterally generated in accordance with an oscillation of the main light, a main optical system which introduces a light from the light source to the substrate via the mask, a light sensor having sensitivity to a wavelength including the main light, and a separation device disposed an a light path from the light source to the light sensor, the separation device separating the main light and the sub light.
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