发明名称 METHOD OF PRODUCING PARTICULATE ARRANGEMENT STRUCTURE, AND METHOD OF PRODUCING OPTICAL MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a method of producing a particulate arrangement structure by which a substrate holding a particulate layer is not limited by a method of producing the particulate layer, and the arrangement of the particulates is hardly affected by the ruggedness of the surface of the substrate, and to provide a method of producing an optical medium. SOLUTION: The surface of a plastic substrate 100 such as a PET film subjected to a sand blast treatment is used as a first substrate 1. Next, a buffer layer 3 and a particulate layer 4 are formed on the first substrate 1, e.g., by a self-organizing method, concretely, by a natural precipitating method or a pulling method. The buffer layer 3 is formed to a thickness in a degree of covering-up the ruggedness of the surface in the first substrate 1 by particulates with a particle diameter smaller than that of the particulates composing the particulate layer 4. Then, an adhesive material layer 18 is formed on the second substrate 2, and the first substrate 1 and the second substrate 2 are press-contacted. Thereafter, the first substrate 1 and the second substrate 2 are separated, and the particulate layer 4 is transferred to the surface of the second substrate 2, so that the particulate-arranged structure 10 is produced. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004261746(A) 申请公布日期 2004.09.24
申请号 JP20030056173 申请日期 2003.03.03
申请人 SONY CORP 发明人 AKAO HIROTAKA;TODA ATSUSHI
分类号 G03B21/60;B01J19/00;B05D1/18;B05D7/24;C03C17/04;(IPC1-7):B05D7/24 主分类号 G03B21/60
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