| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a microcrystal film and a microcrystal film solar cell which enhances qualities and deposition rate of the microcrystal film, and enhances performances, and reduces manufacturing costs of a thin-film semiconductor device, in particular a solar cell employing the microcrystal film. <P>SOLUTION: The microcrystal film is formed to satisfy such deposition requirements that a light generation section 5 caused in the vicinity of a high-frequency electrode 1 and a light generation section 6 caused in the vicinity of a ground electrode 2 are superposed. Further, letting d be a spatial distance between the electrode 1 and the electrode 2, s1 be a thickness of a dark section in the vicinity of the electrode 1, p1 be a thickness of the section 5, s2 be a thickness of a dark section in the vicinity of the electrode 2, and p2 be a thickness of the section 6, the following conditional equation should be satisfied: s1+p1+s2+p2>d>s1+s2+(p1+p2)/2. In the method for manufacturing the microcrystal film solar cell, at least an optical active layer consists of the microcrystal film, the microcrystal film is formed to satisfy the deposition requirements mentioned above, and the optical active layer is formed so that the crystal volume fraction of the microcrystal film falls within a range of 30-70%. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
