| 摘要 |
A substrate such as a semiconductor wafer is move across the top of an open trough while a liquid is maintained in the trough at a level just above the walls of the trough, as by supplying the liquid to the trough so that the liquid gently overflows the trough. The downwardly-facing surface of the substrate contacts the liquid. The substrate is moved at a constant rate so that the duration of contact is the same for all portions of the surface.
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