| 摘要 |
Interferometric apparatus and methodology for monitoring the relative motion among objects, preferably that of mask and wafer stages in photolithographic processes. The apparatus comprises a plurality of interferometers with each operating to provide a mixed optical interference signal containing phase information indicative of the motion of a corresponding object. Electrical interference signals are generated from the optical interference signals, and one of these is modified to compensate for any Doppler shift differences among the electrical interference signals caused by differences in preferred relative rates of motion in the objects. A mixer receives the electrical interference signals and the modified electrical interference signal and generates an output electrical interference signal containing information about the relative motion between objects. In another aspect of the invention the plurality of interferometers are configured to optically compensate for any Doppler shift differences among the mixed optical interference signals.
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