| 摘要 |
PURPOSE: A substrate for an MEMS apparatus and a method for forming the same, and a fluid injection device are provided to exactly measure strain by using the stain gage. CONSTITUTION: A substrate for an MEMS apparatus includes a base material, a strain gage, a dielectric material, and a conductive material. The base material is included in a first surface. The strain gage(30) is formed on the first surface of the base material. The strain gage(30) includes poly silicon. The dielectric material is arranged on the strain gage. The substrate for an MEMS apparatus includes at least one opening. The strain gage(30) is adjacent to the opening. The substrate includes an insulating layer. The base material includes silicon. The insulating layer includes TEOS, silicon dioxide, silicon carbide, and silicon nitride. The poly silicon is doped with dopant material such as boron, phosphorus.
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