发明名称 METHOD FOR TREATING AQUEOUS SOLUTION OF HALOGEN COMPOUND, ACIDIC AQUEOUS SOLUTION, OR ACIDIC GAS, AND ITS APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide durable and efficient method and apparatus for detoxifying an aqueous solution of a halogen compound, an acidic aqueous solution, or acidic gas. <P>SOLUTION: An aqueous solution containing hydrogen chloride (HCl) in introduced into a dissolving tank 30 that stores massive matter or particulate matter consisting of calcium hydroxide (Ca(OH)<SB>2</SB>) or calcium carbonate (CaCO<SB>3</SB>) to change the aqueous solution containing hydrogen chloride (HCl) to an aqueous solution containing calcium chloride (CaCl<SB>2</SB>) in the dissolving tank 30. The aqueous solution of the halogen compound, the acidic aqueous solution, or the acidic gas is introduced into a sedimentation tank 20 into which the resultant aqueous solution containing calcium chloride (CaCl<SB>2</SB>) is fed to precipitate and take out the aqueous solution of the halogen compound, the acidic aqueous solution, or the acidic gas as a difficultly soluble calcium compound. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004255228(A) 申请公布日期 2004.09.16
申请号 JP20030045428 申请日期 2003.02.24
申请人 KIN KISHUN 发明人 KIN KISHUN;MINAMI WATARU
分类号 B01D53/68;B01D53/50;B01D53/77;C01D3/02;C01F11/22;C01F11/46;C02F1/58;(IPC1-7):C02F1/58 主分类号 B01D53/68
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