| 摘要 |
PROBLEM TO BE SOLVED: To provide a washing device and a washing method for an optical element using a plasma capable of effectively and rapidly treating organic material contaminants which cannot be remove by optical washing. SOLUTION: The washing device has a treatment chamber in which materials to be washed are housed, an exhaust section which maintains the treatment chamber under a reduced pressure or vacuum atmosphere, a gas supply section which supplies gas containing oxygen into the treatment chamber and a plasma forming means for forming the gas into the plasma by utilizing microwaves. The materials to be washed are washed by surface treating the materials to be washed by the gas formed as the plasma. COPYRIGHT: (C)2004,JPO&NCIPI
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