| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve polishing accuracy, in a polishing device for polishing a work with rotation of an upper polishing plate revolving with a carrier. <P>SOLUTION: This polishing device is provided with the upper polishing plate 35(b) which abuts on the top surface of the carrier 100(a), which is engaged with a sun gear 11 and an internal gear 12 for revolution and while which rotates on a lower polishing plate 13, and similarly revolves with the carrier 100 and while rotates at a rotating speed different from the carrier 100. Relative position of the upper polishing plate 35 and the carrier 100 are provided (d) so that position of a rotary shaft of the upper polishing plate 35 is displaced by the predetermined distance in the revolving direction from a position of the rotary shaft of the carrier 100, on which the upper polishing plate 35 abuts. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
