发明名称 Method for laminating a material layer onto a transparent substrate
摘要 A method for laminating a material layer onto a transparent substrate. The method includes the steps of: providing a transparent substrate having an amorphous silicon layer formed thereon; forming an infrared absorbent metal layer on the material layer; inverting the material layer to laminate the metal layer onto the amorphous silicon layer; and exposing the metal layer and the amorphous silicon layer to infrared light to cause a metal silicide producing reaction and thus laminate the material layer and the transparent substrate.
申请公布号 US2004178173(A1) 申请公布日期 2004.09.16
申请号 US20030457933 申请日期 2003.06.10
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHANG CHICH SHANG;LEE CHI-SHEN;HUANG SHUN-FA;CHANG JUNG FANG;HU WEN-CHIH;WANG LIANG-TANG;SHEU CHAI-YUAN
分类号 C03C27/04;(IPC1-7):B44C1/22 主分类号 C03C27/04
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