发明名称 |
Method for laminating a material layer onto a transparent substrate |
摘要 |
A method for laminating a material layer onto a transparent substrate. The method includes the steps of: providing a transparent substrate having an amorphous silicon layer formed thereon; forming an infrared absorbent metal layer on the material layer; inverting the material layer to laminate the metal layer onto the amorphous silicon layer; and exposing the metal layer and the amorphous silicon layer to infrared light to cause a metal silicide producing reaction and thus laminate the material layer and the transparent substrate.
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申请公布号 |
US2004178173(A1) |
申请公布日期 |
2004.09.16 |
申请号 |
US20030457933 |
申请日期 |
2003.06.10 |
申请人 |
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
CHANG CHICH SHANG;LEE CHI-SHEN;HUANG SHUN-FA;CHANG JUNG FANG;HU WEN-CHIH;WANG LIANG-TANG;SHEU CHAI-YUAN |
分类号 |
C03C27/04;(IPC1-7):B44C1/22 |
主分类号 |
C03C27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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