PHOTORESIST WASHING LIQUID COMPOSITION, PATTERN FORMATION METHOD USING THE COMPOSITION AND SEMICONDUCTOR DEVICE PREPARED BY USING THE METHOD

摘要

PURPOSE: A photoresist washing liquid composition, a method for forming a photoresist pattern by using the composition and a semiconductor device prepared by using the method are provided to reduce surface tension, thereby reducing the collapse of a pattern when a semiconductor substrate is washed in the final step of development. CONSTITUTION: The photoresist washing liquid composition comprises water as a main component; 0.001-2 wt% of a surfactant represented by the formula 1 as an additive; and optionally 0-20 wt% of an alcohol, wherein R is an alkyl group of C8-C20 or an aromatic group of C3-C20; x, y and z are an integer of 0-10; and n is an integer of 3-50. Preferably the alcohol is selected from the group consisting of a C1-C10 alkyl alcohol and a C1-C10 alkoxy alcohol.