| 发明名称 |
Positive resist composition and method of forming a resist pattern using the same |
| 摘要 |
A positive resist composition comprises (A) a resin comprising specific repeating units and coming to have enhanced solubility in an alkaline developing solution by the action of an acid and (B) a compound generating an acid by the action of actinic rays or a radiation.
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| 申请公布号 |
EP1457819(A2) |
申请公布日期 |
2004.09.15 |
| 申请号 |
EP20040004961 |
申请日期 |
2004.03.03 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
SASAKI, TOMOYA |
| 分类号 |
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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