发明名称 |
Determining a possible cause of a fault in a semiconductor fabrication process |
摘要 |
A method and apparatus for determining a possible cause of a fault in a semiconductor fabrication process. The method includes determining a first fault in a first processing tool executing under first operating conditions and determining a second fault in a second processing tool executing under second operating conditions. The method further includes identifying a possible source of the second fault based on at least the first operating conditions of the first processing tool.
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申请公布号 |
US6790680(B1) |
申请公布日期 |
2004.09.14 |
申请号 |
US20020052055 |
申请日期 |
2002.01.17 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
GROVER JASON A.;COSS, JR. ELFIDO;CONBOY MICHAEL R.;ALLEN, JR. SAM H. |
分类号 |
H01L21/00;(IPC1-7):H01L21/00;G06F19/00 |
主分类号 |
H01L21/00 |
代理机构 |
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地址 |
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