发明名称 |
Semiconductor device with improved capacitive element and method of forming the same |
摘要 |
A semiconductor device includes: a digital circuit including a first capacitive element of metal-insulator-metal structure, and an analogue circuit including a second capacitive element of metal-insulator-metal structure. Bottom electrodes, capacitive insulation layers, and top electrodes of the first and second capacitive elements are formed in the same or common processes to each other. The bottom electrodes are electrically connected with contacts in an underlying inter-layer insulator. The top electrodes are electrically connected with other contacts in an overlying inter-layer insulator.
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申请公布号 |
US6791135(B2) |
申请公布日期 |
2004.09.14 |
申请号 |
US20030390915 |
申请日期 |
2003.03.19 |
申请人 |
NEC ELECTRONICS CORPORATION |
发明人 |
TAKENAKA MOTOHIRO |
分类号 |
H01L21/28;H01L21/02;H01L21/316;H01L21/3205;H01L21/768;H01L21/822;H01L21/8242;H01L23/52;H01L27/04;H01L27/108;(IPC1-7):H01L27/108;H01L21/823 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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