发明名称 Multi-input, multi-output motion control for lithography system
摘要 A multi-input, multi-output vibration control system for a lithography system. The system provides an actuator, and a sensor useful for controlling vibrations in systems for fabricating electronics equipment. The system includes a processor programmed with a multi-input, multi-output control technique such as a linear quadratic Gaussian, H-infinity or mu synthesis. The actuator may comprise one or more plates or elements of electroactive material bonded to an electroded sheet.
申请公布号 US6791098(B2) 申请公布日期 2004.09.14
申请号 US20010803320 申请日期 2001.03.09
申请人 CYMER, INC. 发明人 PLETNER BARUCH;PERKINS RICHARD;LUBLIN LEONARD
分类号 H01L21/027;F16F15/00;F16F15/02;F16F15/027;G03F7/20;G05D19/02;H01L41/047;H01L41/053;H01L41/09;H04R17/08;(IPC1-7):G01N21/86;G03B27/42 主分类号 H01L21/027
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