发明名称 |
Multi-input, multi-output motion control for lithography system |
摘要 |
A multi-input, multi-output vibration control system for a lithography system. The system provides an actuator, and a sensor useful for controlling vibrations in systems for fabricating electronics equipment. The system includes a processor programmed with a multi-input, multi-output control technique such as a linear quadratic Gaussian, H-infinity or mu synthesis. The actuator may comprise one or more plates or elements of electroactive material bonded to an electroded sheet. |
申请公布号 |
US6791098(B2) |
申请公布日期 |
2004.09.14 |
申请号 |
US20010803320 |
申请日期 |
2001.03.09 |
申请人 |
CYMER, INC. |
发明人 |
PLETNER BARUCH;PERKINS RICHARD;LUBLIN LEONARD |
分类号 |
H01L21/027;F16F15/00;F16F15/02;F16F15/027;G03F7/20;G05D19/02;H01L41/047;H01L41/053;H01L41/09;H04R17/08;(IPC1-7):G01N21/86;G03B27/42 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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