发明名称 EFFECTIVE SURFACE CLEANING METHOD AND APPARATUS TO PREVENT DAMAGE TO CIRCUIT FORMED IN SUBSTRATE AND IMPROVE PREHEATING EFFICIENCY
摘要 PURPOSE: An effective surface cleaning method is provided to prevent damage to a circuit formed in a substrate and improve preheating efficiency by selectively preheating only the surface to clean among the surfaces of the substrate while using radiant heat. CONSTITUTION: The substrate(2) is relatively transferred with respect to a plasma generating source(200) or the plasma generating source is relatively transferred with respect to the substrate. The radiant heat is reflected from a radiant heat source(101) to be irradiated to the surface to be cleaned among the surfaces(2a,2b) of the substrate so that the surface to be cleaned is selectively preheated. Process gas that is induced to a plasma generating space(202) formed between two electrodes(201a,201b) insulated by an insulator is converted into plasma by using an AC voltage applied from an AC power(206). The generated plasma comes in contact with the surface of the preheated substrate to remove contaminant formed on the surface.
申请公布号 KR20040079029(A) 申请公布日期 2004.09.14
申请号 KR20030013921 申请日期 2003.03.06
申请人 SEMTECHNOLOGY CO., LTD. 发明人 LEE, HAK JU
分类号 H01L21/02;H01L21/3065;H05H1/24;(IPC1-7):H01L21/306 主分类号 H01L21/02
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