| 摘要 |
PURPOSE: Provided are an exposure apparatus of the band-shaped work, wherein the apparatus is capable of parallel setting mask and work stage even when a band-shaped work on a circumferential part of which bending or waving is formed exists on the work stage, and a method for parallel setting the mask and the work stage. CONSTITUTION: In an exposure apparatus of band-shaped work (W) for exposing the band-shaped work by sequentially transferring the band-shaped work, the apparatus comprises a work stage (5) for holding the band-shaped work; a gap setting mechanism (7) setting an inclination of the work stage such that the work stage is parallel to a mask (M); spacers (11) for setting a gap between the mask and the work stage; and an inserting and retreating mechanism for inserting and retreating the spacers between the mask and the work stage. In a parallel setting method for parallel setting mask and work stage in an exposure apparatus, the method comprises the steps of inserting a plurality of spacers having the same height between the mask and the work stage by an inserting and retreating means; approaching the mask and the work stage to each other; contacting the mask and a portion of the work stag which dos not hold a work with the spacers being interposed therebetween, and fixing the work stage and the mask with an inclination of the work stage being corresponding to an inclination of the mask so that a gap between the mask and the work stage is constantly maintained by a gap setting mechanism; and distancing the mask and the work stage from each other so that the spacers are retreated by the inserting and retreating means.
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