| 摘要 |
PURPOSE: Provided are a radiation sensitive resin composition having high radiation sensitivity and a sufficient margin for development, easily forming a patterned thin film excellent in adhesion and properly forming an interlayer insulating film and microlenses, methods for forming the interlayer insulating film and microlenses using the composition, and an interlayer insulating film and microlenses formed from the composition. CONSTITUTION: The radiation sensitive resin composition contains (A) a high molecular compound having an acetal structure and/or ketal structure, and epoxy structure and having 2,000 or more a polystyrene reduced weight average molecular weight measured by a gel permeation chromatography, and (B) a compound generating an acid having 4.0 or less of pKa by irradiation of radiation, wherein the radiation sensitive resin composition further contains (C) 1,2-quinonediazide compound, and wherein the radiation sensitive resin composition is used to form an interlayer insulating film and microlenses. The method for forming an interlayer insulating film comprises a process of forming a coating film of the radiation sensitive resin composition on a substrate, a process of irradiating radiation onto at least a part of the coating film, a development process, and a heating process. The method for forming microlenses comprises a process of forming a coating film of the radiation sensitive resin composition on a substrate, a process of irradiating radiation onto at least a part of the coating film, a development process, and a heating process.
|
