MULTIRATE PROCESSING FOR METROLOGY OF PLASMA RF SOURCE
摘要
An RF generator is provided for use in an RF plasma system. The RF generator includes: a power source that is operable to generate RF power signals at a tuned frequency; a sensor unit that is adapted to detect the RF power signals and operable to generate analog signals representative of the RF power signals, where the analog signals include a frequency of interest and a plurality of interfering frequency components; and a sensor signal processing unit that is adapted to receive the analog signals from the sensor unit and to band limit the analog signals within a predefined bandwidth that passes the frequency of interest and rejects interfering frequency components.
申请公布号
WO2004008502(A3)
申请公布日期
2004.09.10
申请号
WO2003US11266
申请日期
2003.04.14
申请人
ENI TECHNOLOGY, INC.;COUMOU, DAVID, J.;KIRK, MICHAEL, L.