| 摘要 |
PURPOSE: Provided are polymers that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoresists that comprise such polymers, wherein the polymers preferably have organic content. CONSTITUTION: The photoimageable composition comprises a photoactive component and a polymer component, the polymer component comprising a polymer having repeat units of the following formula (I), wherein R is hydrogen or a non-hydrogen substituent; and m and n are each greater than zero, wherein the polymer has repeat units of the following formula (II), wherein R¬1 and R¬2 are different and may be hydrogen or a non-hydrogen substituent, with at least one of R¬1 and R¬2 being other than hydrogen; and x, y and z are each greater than zero. The photoimageable composition comprises a photoactive component and a polymer component, the polymer component comprising a polymer obtainable by reaction of one or more compounds of the formula: M(Y)4, wherein each M is Si, Ti, Zr, Ge or Sn; each Y is the same or different and at least two Y groups are reactive groups. The photoresist composition is suitable for imaging at 157 nm, the composition comprising a photoactive component and a polymer component, wherein the photoresist composition has Abs157/μm of 1.5 or less.
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