发明名称 Method for forming transparent conductive film, transparent conductive film, glass substrate having the same and photoelectric transduction unit including the glass substrate
摘要 The present invention presents a method for forming a transparent conductive film whose principal component is tin oxide by so-called CVD on a glass ribbon, preventing the generation of giant crystal grains in the tin oxide, while ensuring that the concentration of carbon is low, or in other words, the absorption coefficient at 400 to 550 nm wavelength is low. In accordance with the invention, the method for forming a transparent conductive film whose principal component is tin oxide by CVD on a glass ribbon includes forming the transparent conductive film at a film deposition speed of 3000 to 7000 nm/min using a raw material gas including 0.5 to 2.0 mol % of an organic tin compound.
申请公布号 US2004175500(A1) 申请公布日期 2004.09.09
申请号 US20040484065 申请日期 2004.01.16
申请人 FUJISAWA AKIRA;KIYOHARA KOICHIRO;HIRATA MASAHIRO;ICHIKI KIYOTAKA;SAWADA TORU 发明人 FUJISAWA AKIRA;KIYOHARA KOICHIRO;HIRATA MASAHIRO;ICHIKI KIYOTAKA;SAWADA TORU
分类号 C03C17/00;C03C17/245;C03C17/34;C23C16/40;C23C16/54;H01L31/18;(IPC1-7):B32B17/06;C23C16/00 主分类号 C03C17/00
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