发明名称 |
Electrostatic discharge protection circuit |
摘要 |
An electrostatic discharge (ESD) protection circuit formed on a P-type substrate. The ESD protection circuit is disposed between a bonding pad and an internal circuit formed on a P-type substrate, and has a P-type metal-oxide semiconductor (PMOS) and an N-type metal-oxide semiconductor (NMOS). The PMOS has a first doped regionformed below a P<+> guard ring of the PMOS and a well pick-up of the PMOS. The NMOS has second doped regionformed below a N<+> guard ring of the NMOS and a well pick-up of the NMOS. An equivalent zener diode is formed on the P-type substrate. A breakdown of the equivalent zener diode restricts the PMOS or the NMOS from producing a snapback breakdown.
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申请公布号 |
US6788507(B2) |
申请公布日期 |
2004.09.07 |
申请号 |
US20020063074 |
申请日期 |
2002.03.17 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
CHEN SHIAO-SHIEN;TANG TIEN-HAO |
分类号 |
H01L27/02;(IPC1-7):H02H9/00 |
主分类号 |
H01L27/02 |
代理机构 |
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主权项 |
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地址 |
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