摘要 |
Screening apparatus (101,901) for use at an overflow weir (301, 902) in a sewerage system. The apparatus comprises a continuous moving screen band (201,902) and a band cleaning mechanism (608). A first portion (801) of the screen band is configured to move along the weir towards one of its ends , and a second portion (803) of the screen band is configured to move along the weir towards its opposite end. A steeper portion (805) of the screen ban d extends to an elevated position (806) above the first and second portions, a nd the band cleaning mechanism is arranged to remove solid matter from the screen at said elevated position.
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