发明名称 FERROELECTRIC MEMORY DEVICE HAVING EXPANDED PLATE ELECTRODE FOR EASY ELECTRICAL CONTACT AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A ferroelectric memory device having an expanded plate electrode and a fabricating method thereof are provided to form a reliable contact structure between a plate line and a top electrode by connecting directly one plate line to top electrodes of ferroelectric capacitors between two adjacent rows within a cell array region. CONSTITUTION: A bottom interlayer dielectric(64,68) is formed on a semiconductor substrate(50). A plurality of ferroelectric capacitors(80) are arranged in columns and rows on the bottom interlayer dielectric. A top interlayer dielectric(84,88) having via holes is laminated on the entire surface of the semiconductor substrate including the ferroelectric capacitors. A plurality of plate electrodes(PL) are formed within the top interlayer dielectric. The plate electrodes are tangent to upper parts of the ferroelectric capacitors through the via holes.
申请公布号 KR20040077267(A) 申请公布日期 2004.09.04
申请号 KR20030012765 申请日期 2003.02.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JANG, NAK WON;KANG, HYEON YEOL;SONG, YUN JONG
分类号 H01L27/04;G11C11/22;H01L21/8246;H01L27/115;H01L31/109;(IPC1-7):H01L27/04 主分类号 H01L27/04
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