| 摘要 |
PURPOSE: Provided is forming equipment for producing high quality quartz glass by having paths for discharging SiO and CO gas generated from the high temperature forming process. CONSTITUTION: The quartz glass-forming equipment contains a chamber floor(57) having an inlet(58) into which a carrier gas flows, a support(57) over the floor, and a mold made of graphite, SiC, Si3N4, ZrO2 or Al2O3. The mold comprises an upper side(52-1), a side(52-2) and a lower side(52-3) to which carbon felts(54-1, 54-2) are attached, and in which each side(52-1, 52-2 and 52-3) of the mold has a path(55-1, 55-2 and 55-3) for discharging gases, wherein the porous carbon felts prevent the thermal expansion stress formed between quartz glass and mold, and make gas-discharge easy. The gases(SiO and CO) generated in forming are discharged to the outside along the paths with the carrier gas(inert gas) flown from the gas inlet and the gases generated from the side and the lower side of quartz glass after forming are discharged to the gas-discharging paths through carbon felts. The resultant quartz glass is used for high temperature poly-Si thin film transistor liquid crystal display(TFT-LCD) substrate, photo mask substrate, precision lens, etc.
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