A METHOD OF MANUFACTURING A SPUTTER TARGET

摘要

The invention relates to a method of manufacturing a sputter target. The method comprises the steps of: - providing a target holder having a coefficient of thermal expansion; - providing a target material having a coefficient of thermal expansion. The target material comprises at least a first and a second compound. The first compound has a first coefficient of thermal expansion whereas the second compound has a second coefficient of thermal expansion. The second coefficient of thermal expansion is higher than the first coefficient of thermal expansion and the second coefficient of thermal expansion is higher than the coefficient of thermal expansion of the target holder; - bonding the target material to the target holder. The invention further relates to the resulting sputter target.