PHOTOMASK ASSEMBLY AND METHOD FOR PROTECTING THE SAME FROM CONTAMINANTS GENERATED DURING A LITHOGRAPHY PROCESS
摘要
A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surface of the pellicle frame. The pellicle frame further includes an inner wall and an outer wall. A photomask is coupled to a second surface of the pellicle frame opposite the pellicle film. A molecular sieve that prevents airborne molecular contaminants (AMCs) generated during a lithography process from contaminating the photomask is associated with the pellicle assembly.
申请公布号
WO2004040374(A3)
申请公布日期
2004.09.02
申请号
WO2003US34485
申请日期
2003.10.29
申请人
DUPONT PHOTOMASKS, INC.
发明人
ZHANG, XUN;GORDON, JOSEPH, STEPHEN;PADUANO, JANICE, M.;CHEN, XIAOMING;REYES, JULIO, R.