发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device together with its manufacturing method wherein no leaking occurs in an initial condition and an anti-fuse that can be written in a conductive state by a simple writing circuit is mounted. SOLUTION: An isolated area 3 formed of dispersed insulator layer is formed in an element formation area on a semiconductor substrate 1, and diffusion layers 6 are formed on both sides of the isolated area 3, and then electrodes are connected to the respective diffusion layers 6 to form an anti-fuse. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004247578(A) 申请公布日期 2004.09.02
申请号 JP20030036847 申请日期 2003.02.14
申请人 KAWASAKI MICROELECTRONICS KK 发明人 KUNO ISAMU;KATAGIRI TOMOHARU
分类号 H01L21/82;G11C17/18;H01L21/762;H01L23/525;H01L27/06;(IPC1-7):H01L21/82 主分类号 H01L21/82
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