| 发明名称 |
Imprint lithography template having a feature size under 250 nm |
| 摘要 |
The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.
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| 申请公布号 |
US2004168586(A1) |
申请公布日期 |
2004.09.02 |
| 申请号 |
US20040755997 |
申请日期 |
2004.01.13 |
| 申请人 |
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
发明人 |
BAILEY TODD;CHOI BYUNG J.;COLBURN MATTHEW;SREENIVASAN S.V.;WILLSON C. GRANT;EKERDT JOHN |
| 分类号 |
H01L21/027;B29C35/08;B29C37/00;G03F7/00;G03F9/00;(IPC1-7):B31F1/07;B44B5/00;B41F19/02;G03B27/00 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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