发明名称 MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent measurement errors from occurring and prevent bonding reactions between sensing substances and specific substances from being blocked when using a light beam having a range of wavelength as measuring light in a measuring apparatus such as an apparatus or the like for measuring surface plasmon resonances. SOLUTION: The measuring apparatus is provided with a dielectric block 10, a thin film layer 12 being formed on a surface of the dielectric block 10 and being in contact with a sample, a light source 14 emitting the light beam having the range of wavelength, an incident optical system 15 enabling the light beam 13B to enter the dielectric block 10 so as to be totally reflected by an interface 10a between the dielectric block 10 and the thin film layer 12, and a light detecting means 20 detecting intensity of the light beam 13B being totally reflected by the interface 10a. The measuring apparatus further includes a filter means 23 which is disposed between the light source 14 and the thin film layer 12 and cuts off light having a wavelength range other than that of the light beam 13B subjected to the measurement of the intensity. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004245638(A) 申请公布日期 2004.09.02
申请号 JP20030033760 申请日期 2003.02.12
申请人 FUJI PHOTO FILM CO LTD 发明人 TANI TAKEHARU;NAYA MASAYUKI
分类号 G01N21/27;(IPC1-7):G01N21/27 主分类号 G01N21/27
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