发明名称 |
Method of treating surface of substrate used in biological reaction system |
摘要 |
Provided is a method of treating a surface of a substrate used in a biochemical reaction system, the method including forming a polymer film on the surface by vapor deposition of a compound of formula (1) below and a compound of formula (2) below: (RO)3 - Si - (CH2)n1 - X (RO)3 - Si - (CH2)n2 - (CF2)m - X wherein R is one of a methyl group and an ethyl group, X is one of a methyl group and a trifluoromethyl group, n1 is an integer from 1 to 3, n2 is an integer from 1 to 10, and m is an integer from 1 to 10. <IMAGE>
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申请公布号 |
EP1452232(A2) |
申请公布日期 |
2004.09.01 |
申请号 |
EP20040001606 |
申请日期 |
2004.01.26 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, SUN-HEE;LEE, SOO-SUK;LIM, GEUN-BAE;LEE, YOUNG-SUN |
分类号 |
C12N15/09;B01L3/00;B01L7/00;B05D7/24;C03C17/30;C12M1/00;C12Q1/68;(IPC1-7):B01L3/00 |
主分类号 |
C12N15/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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