发明名称 |
THIN FILM TRANSISTOR ARRAY SUBSTRATE AND FABRICATION METHOD THEREOF, ESPECIALLY CONCERNED WITH INCREASING THE SIZE OF CONTACT HOLES REGARDLESS OF LINE WIDTHS OF THE SOURCE/DRAIN ELECTRODES |
摘要 |
PURPOSE: A TFT array substrate is provided to form line widths of source/drain electrodes so as to be bigger than sizes of source/drain contact holes thereby improving transmittance and aperture ratio. CONSTITUTION: An active layer(114) is formed on a lower substrate. A gate electrode(106) is overlapped with the active layer(114). Plural gate insulating films are formed between the gate electrode(106) and the active layer(114) and on the gate electrode(106). Through-holes pierce through the plural gate insulating films, and expose the active layer(114). A source electrode(108) and a drain electrode(110) have narrower line widths than the through-holes, and are contacted with the active layer(114).
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申请公布号 |
KR20040076041(A) |
申请公布日期 |
2004.08.31 |
申请号 |
KR20030011358 |
申请日期 |
2003.02.24 |
申请人 |
LG.PHILIPS LCD CO., LTD. |
发明人 |
HA, YONG MIN;KIM, SANG GYU |
分类号 |
G02F1/136;(IPC1-7):G02F1/136 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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