发明名称 WAFER TRANSFER APPARATUS AND METHOD FOR TRANSFERRING WAFER USING THE SAME
摘要 PURPOSE: A wafer transfer apparatus is provided to minimize damage to a lot due to a wafer edge damage and maximally reduce contamination of production equipment by detecting whether a wafer is normally aligned before the wafer is transferred. CONSTITUTION: A plurality of wafers(100) are received in a boat(10) for performing a diffusion process in a diffusion furnace. A transfer(20) unloads the wafer received in the boat. The transfer including a sensor(30) senses the wafer aligned on the boat before the wafer is unloaded from the boat, so as to detect a damaged wafer(110). The sensor may be a photosensor.
申请公布号 KR20040076120(A) 申请公布日期 2004.08.31
申请号 KR20030011462 申请日期 2003.02.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SHIN, CHANG WON
分类号 H01L21/22;(IPC1-7):H01L21/22 主分类号 H01L21/22
代理机构 代理人
主权项
地址