发明名称 |
WAFER TRANSFER APPARATUS AND METHOD FOR TRANSFERRING WAFER USING THE SAME |
摘要 |
PURPOSE: A wafer transfer apparatus is provided to minimize damage to a lot due to a wafer edge damage and maximally reduce contamination of production equipment by detecting whether a wafer is normally aligned before the wafer is transferred. CONSTITUTION: A plurality of wafers(100) are received in a boat(10) for performing a diffusion process in a diffusion furnace. A transfer(20) unloads the wafer received in the boat. The transfer including a sensor(30) senses the wafer aligned on the boat before the wafer is unloaded from the boat, so as to detect a damaged wafer(110). The sensor may be a photosensor.
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申请公布号 |
KR20040076120(A) |
申请公布日期 |
2004.08.31 |
申请号 |
KR20030011462 |
申请日期 |
2003.02.24 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SHIN, CHANG WON |
分类号 |
H01L21/22;(IPC1-7):H01L21/22 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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