WAFER STAGE UNIT OF EXPOSURE EQUIPMENT

摘要

PURPOSE: A wafer stage unit of exposure equipment is provided to maintain constantly temperature of a wafer by performing rapidly a heat exchange process between a wafer and a table. CONSTITUTION: A table(140) is used for absorbing a wafer. A table cooling unit is used for cooling the table. The table cooling unit includes a heat exchange part and a cooler(164). The heat exchange part is formed in the inside of the table in order to cool the table by using the cooling water. The cooler is installed at an outside of a wafer stage unit in order to cool the cooling water and supply the cooling water to the heat exchange part. The table cooling unit further includes a temperature sensor(168) for detecting the temperature of the table and a temperature controller(170) for controlling the cooler.