发明名称 MANUFACTURE MANAGEMENT APPARATUS FOR SEMICONDUCTOR WAFER
摘要 <p><P>PROBLEM TO BE SOLVED: To easily deal with the change of a mask in a manufacturing process for semiconductor wafer. <P>SOLUTION: The wafer manufacture management device contains a treatment flow definition table 1202 storing manufacturing flow and mask level in a manufacturing process for every kind of wafers, a manufacturing basic information table 1200 storing a mask set name for every kind of wafers, a mask information definition table 1204 storing a plurality of mask names per mask set corresponding to a mask level, and a lot information table 1206 storing manufacturing flow and the kind of a wafer for every manufacturing lot. Furthermore, it contains a circuit for drawing a mask set name corresponding to the kind of a wafer stored for every manufacturing lot from the manufacturing basic information table 1200, a circuit for picking out a mask level based on a present process for every manufacturing lot and the treatment flow definition table 1202, and a circuit for drawing a mask name from the mask information definition table 1204 based on mask set name and mask level. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004241697(A) 申请公布日期 2004.08.26
申请号 JP20030030967 申请日期 2003.02.07
申请人 RENESAS TECHNOLOGY CORP 发明人 INOBE TAKAMASA;OTANI MASAKI;SATO YASUHIRO;MARUME YASUHIRO;WATANABE TOSHIYUKI
分类号 H01L21/027;G03F7/20;G05B19/418;H01L21/00;H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/027
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