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发明名称
Verfahren zur Herstellung eines Halbleitersubstrats
摘要
申请公布号
DE69333282(T2)
申请公布日期
2004.08.26
申请号
DE1993633282T
申请日期
1993.08.24
申请人
CANON K.K., TOKIO/TOKYO
发明人
YONEHARA, TAKAO
分类号
H01L21/02;H01L21/20;H01L27/12;(IPC1-7):H01L21/20;H01L21/76
主分类号
H01L21/02
代理机构
代理人
主权项
地址
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