| 摘要 |
PROBLEM TO BE SOLVED: To develop a substrate without spots in a method of immersing the substrate in a developer and developing it. SOLUTION: By a stage 8, a second storage tank 6 is elevated and the substrate G is immersed in the developer. At that time, the lower end of the substrate G is brought into contact with the liquid surface of the developer at a low speed and then the entire substrate G is made to advance into the developer at a relatively high speed. Thus, dragging of air bubbles and liquid spattering at the time of the advance of the substrate G are prevented. After the substrate G is made to advance into the developer, the second storage tank 6 is moved back and forth in an X direction. The developer collides with the surface of the substrate G vertically and residuals formed on the surface of the substrate G are removed. In such a manner, the substrate G is developed without spots. COPYRIGHT: (C)2004,JPO&NCIPI |
