| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist film stripper/cleaner in which stripping/removing rate is increased furthermore when a resist film adhering to a substrate is stripped/removed by supplying ozonic fluid and an extra cleaning process is eliminated without requiring complete enclosure of a special facility for treating waste liquid and by-products or a facility and a unit for removing troubles caused by leakage of a large quantity of ozone gas. SOLUTION: Immediately before being fed to a substrate to which a resist film is adhering, ozonic fluid is mixed with high temperature vapor so that liquid temperature of the ozonic fluid is raised and stripping/removing rate of the resist film is increased significantly without lowering ozone concentration which causes lowering of resist removing rate thus enhancing resist film removing power. No residue is present on the surface of the substrate after the resist film is stripped/removed, waste liquid or by-products having adverse effect on the environment are not generated nor a large quantity of ozone gas leaks out. COPYRIGHT: (C)2004,JPO&NCIPI |
