发明名称 POROUS FILM-FORMING COATING LIQUID, INSULATION FILM, AND MANUFACTURING METHOD THEREFOR, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To prepare a film-forming coating liquid which is useful in forming a low dielectric constant insulation film, gives the insulation film having good adhesion to wiring and other parts, does not allow the insulation film to peel by the stress in a semiconductor device, and moreover gives the insulation film having not so high hygroscopicity. SOLUTION: The film-forming coating liquid is constituted by containing at least a first film-forming component having small polarity of its molecule and a high molecular weight and a second film-forming component having larger polarity of its molecule and a lower molecular weight than the first film-forming component. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004238470(A) 申请公布日期 2004.08.26
申请号 JP20030028563 申请日期 2003.02.05
申请人 FUJITSU LTD 发明人 NAMIKI TAKAHISA
分类号 C09D201/00;C09D5/25;H01L21/312;(IPC1-7):C09D201/00 主分类号 C09D201/00
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