| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method and an exposure apparatus for adequately eliminating light absorbing substance from the space provided between a projection optical system and a substrate, and measuring accurately the position of a stage using the optical beam for measuring the position. SOLUTION: The exposure apparatus is provided with a reflection member 47a provided on a stage 46 on which a substrate W is placed for reflecting the optical beam for measuring the position used for position measurement of the stage 46, a gas supplying system 50 provided in the space between the substrate W and projection optical system PL for supplying the predetermined gas which transmits the energy beam, and an absorbing mechanism 95 for absorbing the gas including the predetermined gas via a groove on the stage 46 formed between the substrate W and the reflection member 47a. Flow of the predetermined gas to the optical path for the optical beam for position measurement can be controlled. COPYRIGHT: (C)2004,JPO&NCIPI |
