| 摘要 |
An exposure apparatus wherein an object to be exposed (15) is exposed by being irradiated with a pulse light with a wavelength of 300 nm or less which is transmitted through a plurality of optical members (2, 4a, 4b, 6, 7, 9, 12) is disclosed. At least one of the optical members (2, 4a, 4b, 6, 7, 9, 12) is composed of a synthetic quartz glass material so that the thickness of the synthetic quartz glass material, the energy density per pulse of the pulse light and the pulse width of the pulse light satisfy the following formula: tauI<-2>L<-1.7> >= 0.02 (ns.mJ<-2>.cm<2.3>.pulse<2>) (wherein L represents the thickness of the synthetic quartz glass material (unit: cm); I represents the energy density per pulse (unit: mJ.cm<-2>.pulse<-1>); and tau represents the pulse width (unit: ns)). |
